● Obtained International Patent for bevel recovery.
● The world's top-class function and technology in collecting hydrophilic surface.
● High-efficiency equipment to perform following process on silicon wafers by automatically;
VPD Process -> Scanning wafer surface and sampling contaminants -> Dilution of sampling solution
● An extremely effective device when it is necessary to take a sample from a large number of wafers at one time and analyze it.
● Sampling nano metal contamination from surface and sides (bevel parts) of silicon wafers.
● Able to collect contamination of both hydrophobic and hydrophilic wafer surfaces.
* Please note that bevel parts are when hydrophobic wafers only.
● Can process bulk etching.
● Uniformity / Flatness of wafers after etching process is within 10%.
● A function of measuring and diluting the sampling solution, and prevents the work from continuing with the
solution remaining on the wafer.
● Double door prevents the acid atmosphere in devices from mixing with contaminants on the operator.
● Automatically clean the liquid holder used for sampling. It will lead to saving time of operators
(Compatible with both normal and bevel holders).
There has been a significantly high need for the device that performs all following process automatically in these days
for the purpose of reducing contamination (Applicable by NAC-316);
Bulk etching -> Sampling contaminations -> ICP-MS connection & elemental analysis
| Device Name | NAC-302 | NAC-304 | NAC-316 | |||||||
| Wafer Size | 125mm,150mm, 200mm,300mm |
125mm,150mm, 200mm,300mm |
300mm | |||||||
| Operation | PC | |||||||||
| Bulk Etching Function | ー | 〇 | 〇 | |||||||
| ICP-MS Auto Connection | ー | ー | 〇 | |||||||
| Automatic Preparation of ICP-MS Calibration Curve |
ー | ー | 〇 | |||||||
| Load Port | ー | ー | 〇 | |||||||
| Basic Sampling Pattern | Ring-shaped, Fixed Radius, Side (Bevel) | |||||||||
| Size (W×D×H)(mm)(*1) | 1850×1350×2000 | 2000×1500×2000 | 1700×2800×2300 | |||||||
| Equipment used | Acid drainage，General exhaust，Acid exhaust | |||||||||
| Recommended Environment |
Inside Clean Room | |||||||||
| Utilities | AC-100V 15A, N2, CDA, DIW |
AC-100V 15A, DIW, O2, N2, CDA | ||||||||
