● A compact device that uses the natural vaporization of HF to VPD the oxide film and nitride film on
the silicon wafer to make the wafer surface hydrophobic.
● PTFE and PVDF are used where the acid solution and acid atmosphere come into contact.
● Please use VPDBOX in combination with SC series.
| Device Name | VPDBOX-200-1M | VPDBOX-300-1M | VPDBOX-300-5M | VPDBOX-300-6M | |||||||||
| Maximum Number of Wafers to be Processed |
1SH | 1SH | 5SH | 6SH | |||||||||
Wafer Size |
100mm | 〇 | 〇 | 〇 | 〇 | ||||||||
| 125mm | 〇 | 〇 | 〇 | 〇 | |||||||||
| 150mm | 〇 | 〇 | 〇 | 〇 | |||||||||
| 200mm | 〇 | 〇 | 〇 | 〇 | |||||||||
| 300mm | ― | 〇 | 〇 | 〇 | |||||||||
| Size(W×D×H)(mm)(※1) | 290×290×250 | 390×390×250 | 410×405×410 | 410×405×460 | |||||||||
| Weight | 6kg | 8kg | 15kg | 18kg | |||||||||
| Recommended Environment |
Inside Clean Draft | ||||||||||||
| Utilities | N2 (for Acid Atmosphere Purging) | ||||||||||||
